Bruker’s automated AFMs provide proven industrial metrology solutions for surface roughness measurement, chemical mechanical planarization (CMP), and etch-depth measurements on the most current technology nodes and wafers.
Atomic Force Profiling is the最准确的,非破坏性的方法可用于优化和监视具有挑战性的CMP和蚀刻过程步骤。直接测量不需要测试结构或模型,并且可以在DIE的活跃区域中等高,以获得最佳的过程变化敏感性。
How Can We Help?
Bruker partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.