Semiconductor Solutions


Cryogenic CO₂ Cleaning

Extremely fast and environmentally friendly, Bruker's dry cryogenic CO2cleaning technology offers unique advantages over conventional cleaning techniques. The Bruker technology is cost effective, non-destructive, waste and residue free, and eliminates corrosion and staining. With over 100 tools installed, Bruker provides Cryogenic CO2process equipment for a broad range of applications across most semiconductor market segments.

Why Consider Cryogenic Cleaning

Our customers benefit from many inherent aspects of the technology and the perfected, patented features of Bruker's equipment. Our cryo dry cleaning systems deliver on a low cost of ownership with:

  • 使用我们的专利喷嘴设计的卓越清洁性能
  • Proven 24/7 production performance for high-demand applications
  • 高通量确保高资本利用
  • Compact system design requiring minimal cleanroom space
  • Yield improvements not seen with standard wet or plasma cleaning processes

Bruker's Commitment

As the leading innovator of dry CO2technology, Bruker sets the standard for quality dry process cleaning. The company currently holds over 25 U.S. and International patents in many areas of cryogenic CO2cleaning. This innovation has been the standard in production cryogenic CO2cleaning for over 30 years.

Our state of the art applications lab in Delray Beach, FL provides a location where our global customer base can come to develop new cleaning techniques or optimize their existing processes.

To learn more about how Cryogenic CO2cleaning technology can resolve your most difficult contamination problems, pleasecontact us有关更多信息或安排演示。


How Can We Help?


Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.

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