Semiconductor & Nanotech

Opto LED

Bruker’s metrology solutions offer accurate and repeatable measurements for production monitoring and yield improvement.

LED Epi Layer Monitoring

HRXRD is well established for the measurement of epi-layers. The BrukerQCVelox-E是LED监测中艺术领导者的状态,并且在整个行业中广泛使用。

QCVelox-E使完全自动化,通过高hput HRXRD measurements, along with automaticRADS analysisand reporting of the results to enable customers to monitor their process without needing X-ray experts to analyze data. Optional SECS-GEM factory host software and robot loading are available to complete the automation of the system.

半导体底物的常规分析

Improving Patterned Sapphire Substrate Performance and Yield

了解图案蓝宝石底物(PSS)的纳米级维度对于下一代材料开发和维持生产质量至关重要。必威手机客户端布鲁克的3D Optical Profilers提供PSS特征的高度,音高和直径的快速,准确的测量。

Extensive automation features enable operator-independent metrology of numerous sites so that process variations across wafers can be well understood and controlled.

In addition,optical profilersandStylus Profilersare used to characterize the roughness, thickness and shape of phosphor layers which are used to create white light from an underlying blue LED. These properties have a large affect on the efficiency of light conversion, and can also affect the color and uniformity of illumination.

Sub-Nanometer Metrology of PSS Structures

As the pitch of patterned sapphire substrate goes below 2 microns, where optical techniques cannot achieve the resolution needed to provide valuable process metrology,atomic force microscopes(AFM)提供准确的解决方案。它们提供了子纳米分辨率的分辨率,并能够测量将PSS制造过程控制在控制过程中所需的所有数据。

Grain Texture and Elemental Analysis of Optoelectronic Devices

Understanding features on nano to micro meter scales in elemental composition and crystallographic properties is a requirement to understand performance and behavior of modern optoelectronic devices. Bruker provides a variety of electron microscope analyzers to investigate those properties on SEM and TEM systems. Bruker's electron microscope analyzers, such asEDS for SEMandtem,EBSD,WDSandMicro-XRF, allow the analysis of texture (EBSD) and the element distributions down to ppm with high spatial resolution and also in layered materials (Micro-XRF). Particularly fast analysis, such as needed in quality control or for large sample areas, is possible using a high collection angle device, such as the BrukerXFlash® FlatQUADdetector.

激光和LED发射,电致发光

FT-IR emission spectroscopyis the ideal tool to analyze novel IR sources, lasers, LEDs or electroluminescence. Highest spectral resolution of the research series FT-IR spectrometers allows completely resolving the laser modes. Time-resolved measurement with temporal resolution down to the low ns range enables the acquisition of single laser pulses. Amplitude-modulated step scan making use of lock-in technique offers a possibility to record very weak emission signals. For small emitters in mm or µm range an IR microscope adapted to a research spectrometer provides excellent lateral resolution and utmost sensitivity for emission microscopy at the same time.

Detector Testing and Characterization by FT-IR

Self-developed infrared detectors can be tested and characterized with Bruker FT-IR research spectrometers. Single element detectors may be directly adapted to external optics of the research series spectrometers. For characterization of focal plane array (FPA) detectors dedicated external measurement modules are available.