TriboLab CMP
R＆D规模的过程和材料表征系统
Punti Salienti
TriboLab CMP
Leveraging over 20 years of CMP characterization expertise with its predecessor product (Bruker CP-4), TriboLab CMP brings a complete set of capabilities to the industry-leading TriboLab platform. The resulting accuracy and measurement repeatability enables the highly effective qualification, inspection, and ongoing functionality testing required throughout the CMP process. TriboLab CMP is the only process development tool on the market that can provide a broad range of polishing pressure (0.05-50 psi), speeds (1 to 500 rpm), friction, acoustic emissions, and surface temperature measurements for accurate and complete characterization of CMP processes and consumables.
Unmatched
小型研发系统中的ROI
该台式工具可复制全面的晶圆抛光过程条件，而无需停机。
Flexible
参数控制
允许量身定制的测试可以准确地加速材料的开发和完善过程。必威手机客户端
专家
申请和支持
Our many years in working in partnership with a large install base delivers expertise to your lab.
Caratteristiche
Small R&D-Scale Specialty System for CMP
Bruker的Tribolab CMP过程和材料表征系统是从头开始设计的，专门针对晶圆抛光过程的可靠，灵活和成本效益的基准表征。
- 复制全面的晶圆抛光过程条件，而无需停机的生产设备
- Provides unmatched measurement repeatability and detail
- 允许在小型优惠券上进行测试，以节省整个续签测试
板载诊断，以更好地理解抛光过程
Testing conditioning discs on the TriboLab CMP tester. Tests identify two groups of discs. Friction coefficient tests correlate with pad wear.
- Delivers more visibility into transient polishing properties than any other system on the market
- 从基板接触垫的瞬间收集数据，并在整个测试中收集
- 通过更完整的详细数据启用早期过程开发决策
样品类型，大小和安装配置的灵活性
- Polishes any flat material, using virtually any conditioning disc, any slurry, and any pad
- Accommodates small coupons through whole 100 mm wafers with ease
- 接受多个样品支架以灵活性
Schematic of CMP tester for conditioner pad tests.