InSight CAP
Non-destructive Metrology for Etch and CMP
强调
紧凑的外形的高性能分析师和AFM
Bruker's InSight CAP automated atomic force profiler is specifically designed to be a combined platform for CMP and etch metrology for semiconductor manufacturers and suppliers. Flexible configurations to support wafer sizes from 100 mm to 300 mm enable precision measurements for a wide range of end applications. From highly productive labs to fully automated fabs the InSight CAP profiler can be optimally configured for the most cost-effective metrology solution.
特征
内联测量结果会分钟，适合于蚀刻和CMP中的技术开发和过程控制
在先进的技术节点，多图案光刻技术将纳米级工艺控制要求对CMP放置，以满足焦点的需求。Insight Cap围绕最新一代的AFM扫描仪建立，可在65μmx / y扫描范围内提供改进的平坦度，少于10纳米。该系统的Nanoscope®V64位AFM控制器提供5倍的启动性能和更快的调整，以提高生产率，所有这些都具有增强的可靠性。它的DT自适应扫描模式也有助于更快的扫描和改进的计量学。Insight Cap高分辨率分析器凭借其高级功能的结合，使Angstrom级的精度可以测量麦克罗的盘中和侵蚀。
Flexible configurations to support wafer sizes from 100 mm to 300 mm enable precision measurements for a wide range of end applications. From highly productive labs to fully automated fabs the InSight CAP profiler can be optimally configured for the most cost-effective metrology solution.
支持
支持
How Can We Help?
Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术，并帮助客户选择正确的系统和配件。在工具出售工具很久之后，这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.