InSight CAP
Non-destructive Metrology for Etch and CMP
Punti salienti
紧凑的外形的高性能剖面和AFM
Bruker's InSight CAP automated atomic force profiler is specifically designed to be a combined platform for CMP and etch metrology for semiconductor manufacturers and suppliers. Flexible configurations to support wafer sizes from 100 mm to 300 mm enable precision measurements for a wide range of end applications. From highly productive labs to fully automated fabs the InSight CAP profiler can be optimally configured for the most cost-effective metrology solution.
Caratteristiche
内联测量结果会分钟，适合于蚀刻和CMP中的技术开发和过程控制
At advanced technology nodes, multipattern lithography techniques place nanometer-level process control requirements on CMP to meet depth-of-focus needs. InSight CAP is built around the latest generation AFM scanner to deliver improved flatness, less than 10 nanometers, over a 65 μm X / Y scan range. The system’s NanoScope® V 64-bit AFM controller offers 5x faster engage performance and 5x faster tuning for increased productivity, all with enhanced reliability. Its DT adaptive scan mode also contributes to faster scanning and improved metrology. With its combination of advanced features, the InSight CAP High-Resolution Profiler enables angstrom-level precision to measure in-macro dishing and erosion.
Flexible configurations to support wafer sizes from 100 mm to 300 mm enable precision measurements for a wide range of end applications. From highly productive labs to fully automated fabs the InSight CAP profiler can be optimally configured for the most cost-effective metrology solution.
支持o
支持
How Can We Help?
Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术，并帮助客户选择正确的系统和配件。在工具出售工具很久之后，这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.