Rhazer-III
生产摄影剂雾化缓解和去除
Highlights
Rhazer III
Bruker Rhazer-III®系统专门为晶圆晶圆厂设计，可提供投资雾化的雾霾和管理能力。Rhazer technology isclean和dry。
Features
Photo-Induced Defect Management (Haze Mitigation)
在整个半导体行业中，光诱导的光剂（Haze）上的微观污染已成为越来越普遍且昂贵的问题。最近的湿清洁和环境控制技术有助于在晶圆步骤暴露期间减慢雾霾的形成，但没有任何预防雾剂溶液的希望。Bruker Rhazer-III®系统专门为晶圆晶圆厂设计，可提供投资雾化的雾霾和管理能力。Rhazer技术干净干燥。处理面膜不需要去除膜，也不会对掩模吸收材料造成损害，也不会对相位，传输或CDS进行更改，这意味着可以根据需要的经常清洁网状，而无需离开Fab系列的控制。必威手机客户端
关键性能功能
Increased Lithography Line Efficiency:
- Dry process - no pellicle removal
- Fast turnaround - full reticle clean
- Full control - retcles never leave the wafer fab
- Fewer cleans - no haze formation in storage
Fully Automated Operation:
- SMIF & Overhead Track compatible; RFID/OCR/Barcode readers
- SECS/GEM compatible
- 机器人处理，包括面具脚钳
- Easy to operate; highly user friendly GUI
Extends Mask Lifetime:
- 没有吸收损伤
- No CD, phase or transmission variance
- No added chemical residues
- 清洗数量没有限制
Wafer Fab Cost Savings:
- Less wasted scanner downtime waiting for masks
- 面具非常低的面膜清洁
- Fewer duplicate masks needed
- 缺陷检查之间的扩展间隔
- Reduced haze-related wafer losses
"Green" Technology:
- No acids, solvents or de-ionized water
- No harmful effluents or waste management
- 低能消耗（7kW @ 208V AC）
- 小型系统足迹（124m x 2.31m）
Results
Support
Support
How Can We Help?
布鲁克partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.