Production Photomask Haze Mitigation and Removal
The Bruker Rhazer-III®system is specially designed for the wafer fab to provide an in-fab haze removal and management capability. Rhazer technology is清洁anddry.
Photo-induced micro-contamination on photomasks (haze) has become an increasingly pervasive and costly problem throughout the semiconductor industry. Recent wet clean and environmental control techniques have helped to slow haze formation during wafer stepper exposures, but show no promise of a haze prevention solution. The Bruker Rhazer-III®system is specially designed for the wafer fab to provide an in-fab haze removal and management capability. Rhazer technology is clean and dry. Processing the mask does not require removal of the pellicle and causes no damage to the mask absorber materials and no changes to phase, transmission or CDs, meaning reticles can be cleaned as often as needed without leaving the control of the fab line.
How Can We Help?
Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术,并帮助客户选择正确的系统和配件。在工具出售工具很久之后,这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.