硅半导体的X射线计量学

JVX7300LSI

Versatile X-ray diffractometer for automated thin film production monitoring

投资式研发

JVX7300LSI

高亮

JVX7300LSI

The JVX7300LSI automated diffractometer is designed for in-fab R&D and in-line production process monitoring of semiconductor materials. It enables fully automated characterization of many advanced materials in the semiconductor industry. JVX7300L is the standard configuration, which comprises Scanning HRXRD, XRR, XRD, GI-XRD and WA-XRD for strain metrology, thin film and phase analysis on blanket wafers. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution, and X-ray reflectivity modes without user intervention, even within the same recipe batch. Full automation of the alignment, measurement, analysis and reporting of the results ensures productive and fast characterization of thin films.

High Dynamic
range
0D检测器1d,2d作为选项
水平
安装
Offering fast characterization of thin films on 300mm, 200mm, and 150mm wafer sizes.
Fully Automated
源光学元件
启用标准XRD,高分辨率和X射线反射率模式之间的无人值守切换。

功能

特征

主要特征

Versatile X-ray diffractometer for automated thin film production monitoring

  • XRR: thickness, roughness, density of thin films and stacks
  • XRD(放牧发动机/广角):相位,结晶度,质地,残余应力
  • In-plane XRD: phase, crystallinity of ultrathin films
  • HRXRD: strain, thickness, composition of epitaxial layers.

High throughput

  • High flux source
  • 高动态范围0 d检测器,1 d, 2 d选项. .

高分辨率

  • High angular resolution goniometer
  • Low divergence optics.

300-200-150mm晶片,水平安装

完全自动化

  • 晶圆处理带有2个Foup负载端口
  • Recipe driven tool configuration changes incl. crystals and slits
  • Sample analysis flow – from alignment to report
  • SECS/GEM.

Industry leading control and analysis software RADS, REFS

半S2/S8,CE

应用

申请

Key Applications

The JVX7300LSI is utilized worldwide in advanced nodes logic and memory fabs.

关键应用程序是:

  • High-K thickness, density and crystallinity for DRAM and NAND
  • III-V on Si for future node development
  • 在SI上使用电源晶体管

所有应用程序均由我们的全面分析软件套件启用,用于分析,模拟和拟合:RADS和REFS。

附件

Accessories

Options and Accessories

S渠道

For small spot measurements of test structures on patterned wafers, the S channel can be added, which has a spot size of 50µm x 50 µm at the sample. The channel can be either configured as a high resolution beam, for strain measurements with µHRXRD on epitaxial layers, or as a µXRD beam for phase, crystallinity and orientation measurements on crystalline films.

S频道带有全自动模式识别。

我频道

在平面内XRD测量的可选I通道上,对超薄晶体膜进行了相位和方向监测。

支持

支持

How Can We Help?

Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术,并帮助客户选择正确的系统和配件。在工具出售工具很久之后,这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载

我们训练有素的支持工程师,应用程序科学家和主题专家团队全力致力于通过系统服务和升级以及应用程序支持和培训来最大化您的生产力。betway手机客户端下载

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