投资式研发
The JVX7300LSI automated diffractometer is designed for in-fab R&D and in-line production process monitoring of semiconductor materials. It enables fully automated characterization of many advanced materials in the semiconductor industry. JVX7300L is the standard configuration, which comprises Scanning HRXRD, XRR, XRD, GI-XRD and WA-XRD for strain metrology, thin film and phase analysis on blanket wafers. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution, and X-ray reflectivity modes without user intervention, even within the same recipe batch. Full automation of the alignment, measurement, analysis and reporting of the results ensures productive and fast characterization of thin films.
The JVX7300LSI is utilized worldwide in advanced nodes logic and memory fabs.
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所有应用程序均由我们的全面分析软件套件启用,用于分析,模拟和拟合:RADS和REFS。
For small spot measurements of test structures on patterned wafers, the S channel can be added, which has a spot size of 50µm x 50 µm at the sample. The channel can be either configured as a high resolution beam, for strain measurements with µHRXRD on epitaxial layers, or as a µXRD beam for phase, crystallinity and orientation measurements on crystalline films.
S频道带有全自动模式识别。
在平面内XRD测量的可选I通道上,对超薄晶体膜进行了相位和方向监测。
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