Extreme Lithography Cleaner
生产二氧化碳去除
强调
Extreme Lithography Cleaner (EL-C)
El-C®systems are used for a wide variety of applications including front-side and back-side removal of particles deposited during production and handling, especially particle adders from other equipment. The EL-C process isdry和无污染。Masks can be cleaned as often as needed with 100% soft particle removal efficiency down to 50nm sizes.
eigenschaften
低温气溶胶光剂清洁支撑全面面膜清洁
在制造过程中，晶圆厂中的颗粒污染未知颗粒污染，并且仍然是一个一致的问题。随着掩模材料变得必威手机客户端越来越复杂，几何形状继续缩小，对更有效和无损害清洁技术的需求变得越来越重要。许多较旧的，已建立的清洁技术在移除软颗粒方面的有效性降低，并已成为特征损坏和掩模表面污染的来源。几年前，布鲁克（Bruker）以极端光刻清洁剂（EL-C®）产品系列的形式引入了一种新的面膜清洁替代方案，该产品线是全面面罩的低温干净清洁系统。Bruker El-C®系统现在正在多个面具商店和全球晶圆厂的面具管理设施中进行生产运营。
Fully Automated or Manual Load Operation
- SMIF & Overhead Track compatible; RFID/OCR/Barcode readers
- SECS/GEM compatible
- Easy to operate; Highly user friendly GUI
Anwendungen
Multiple Mask Cleaning Applications
- EUV & Optical Front-side cleaning
- EUV和光学后侧清洁
- Full mask clean
- 局部（现场）清洁
- 修复前清洁（区分“软”经文“硬”缺陷）
- Post-repair clean (nanomachining debris)
- Persistent particle clean
- Removal of adders from other equipment
- Mask blank clean
Support
Support
How Can We Help?
布鲁克partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
我们的训练有素的团队的支持工程师,达成ication scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.