极端光刻清洁剂
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极端光刻清洁剂（EL-C）
El-C®systems are used for a wide variety of applications including front-side and back-side removal of particles deposited during production and handling, especially particle adders from other equipment. The EL-C process is干燥和contamination free。通过100％的软颗粒去除效率降低到50nm尺寸，可以根据需要将口罩尽可能多地清洁。
Особенности
低温气溶胶光剂清洁支撑全面面膜清洁
Unknown particle contamination on advanced photomasks during manufacture and mask handling in wafer fabs has been and remains a consistent problem. As mask materials become more sophisticated and geometries continue to shrink, the need for more efficient and damage free cleaning techniques has become increasingly important. Many of the older, established cleaning technologies have become less effective at soft particle removal and have become sources of feature damage and mask surface contamination. Several years ago, Bruker introduced a new mask cleaning alternative in the form of the Extreme Lithography Cleaner (EL-C®) product line of full mask cryogenic dry clean systems. The Bruker EL-C® system is now in production operation in multiple mask shops and in the mask management facilities of worldwide wafer fabs.
全自动或手动负载操作
- SMIF & Overhead Track compatible; RFID/OCR/Barcode readers
- SECS/GEM compatible
- Easy to operate; Highly user friendly GUI
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Multiple Mask Cleaning Applications
- EUV & Optical Front-side cleaning
- EUV和光学后侧清洁
- 全面面具清洁
- 局部（现场）清洁
- 修复前清洁（区分“软”经文“硬”缺陷）
- 修复后清洁（纳米机械碎片）
- 持续的粒子清洁
- 从其他设备中删除加法器
- Mask blank clean
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布鲁克partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
我们训练有素的支持工程师，应用程序科学家和主题专家团队全力致力于通过系统服务和升级以及应用程序支持和培训来最大化您的生产率。betway手机客户端下载