Extreme Lithography Cleaner
Production CO₂ Cryogenic Particle Removal
Lo más destacado
Extreme Lithography Cleaner (EL-C)
EL-C®系统用于多种应用，包括在生产和处理过程中沉积的颗粒的前侧和后侧去除，尤其是来自其他设备的粒子加成器。EL-C过程是dryandcontamination free. Masks can be cleaned as often as needed with 100% soft particle removal efficiency down to 50nm sizes.
características
Cryogenic Aerosol Photomask Cleaning Supporting Full Mask Clean
Unknown particle contamination on advanced photomasks during manufacture and mask handling in wafer fabs has been and remains a consistent problem. As mask materials become more sophisticated and geometries continue to shrink, the need for more efficient and damage free cleaning techniques has become increasingly important. Many of the older, established cleaning technologies have become less effective at soft particle removal and have become sources of feature damage and mask surface contamination. Several years ago, Bruker introduced a new mask cleaning alternative in the form of the Extreme Lithography Cleaner (EL-C®) product line of full mask cryogenic dry clean systems. The Bruker EL-C® system is now in production operation in multiple mask shops and in the mask management facilities of worldwide wafer fabs.
Fully Automated or Manual Load Operation
- SMIF和高架轨道兼容；RFID/OCR/条形码读取器
- SEC/GEM兼容
- 易于操作；高度用户友好的GUI
Aplicaciones
多个面膜清洁应用
- EUV和光学前侧清洁
- EUV & Optical Back-side cleaning
- Full mask clean
- Local area (spot) clean
- Pre-repair clean (differentiate “soft” verses “hard” defects)
- Post-repair clean (nanomachining debris)
- Persistent particle clean
- Removal of adders from other equipment
- 面具空白清洁
Soporte
支持
How Can We Help?
Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术，并帮助客户选择正确的系统和配件。在工具出售工具很久之后，这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载
我们的训练有素的团队的支持工程师,达成ication scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.