Extreme Lithography Cleaner
Production CO₂ Cryogenic Particle Removal
Destaques
Extreme Lithography Cleaner (EL-C)
EL-C®系统用于多种应用，包括在生产和处理过程中沉积的颗粒的前侧和后侧去除，尤其是来自其他设备的粒子加成器。EL-C过程是dryand无污染. Masks can be cleaned as often as needed with 100% soft particle removal efficiency down to 50nm sizes.
características
Cryogenic Aerosol Photomask Cleaning Supporting Full Mask Clean
在制造过程中，晶圆厂中的颗粒污染未知颗粒污染，并且仍然是一个一致的问题。随着掩模材料变得必威手机客户端越来越复杂，几何形状继续缩小，对更有效和无损害清洁技术的需求变得越来越重要。许多较旧的，已建立的清洁技术在移除软颗粒方面的有效性降低，并已成为特征损坏和掩模表面污染的来源。几年前，布鲁克（Bruker）以极端光刻清洁剂（EL-C®）产品系列的形式引入了一种新的面膜清洁替代方案，该产品线是全面面罩的低温干净清洁系统。Bruker El-C®系统现在正在多个面具商店和全球晶圆厂的面具管理设施中进行生产运营。
Fully Automated or Manual Load Operation
- SMIF和高架轨道兼容；RFID/OCR/条形码读取器
- SEC/GEM兼容
- 易于操作；高度用户友好的GUI
Aplicações
多个面膜清洁应用
- EUV和光学前侧清洁
- EUV & Optical Back-side cleaning
- Full mask clean
- Local area (spot) clean
- Pre-repair clean (differentiate “soft” verses “hard” defects)
- Post-repair clean (nanomachining debris)
- Persistent particle clean
- Removal of adders from other equipment
- 面具空白清洁
Apoio
支持
How Can We Help?
Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术，并帮助客户选择正确的系统和配件。在工具出售工具很久之后，这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载
我们的训练有素的团队的支持工程师,达成ication scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.