Photomask Repair

nm-VI

第六代AFM指导纳米机械

5nm生产光掩模维修

Rave NM-VI

强调

高级,关键级别的光鞋的精确修复

布鲁克’s AFM nanomachining systems are the global standard and preferred production technique for precision repair of advanced, critical-level photomasks. The nm-VI®系统是Bruker的第六代AFM引导的纳米机械。NM-VI将布鲁克(Bruker)与该公司脱颖而出,可以开发和交付与5纳米技术节点及以后的5纳米技术节点合作所需的创新纳米级材料成型过程。

Wide Range
of removable materials
包括铬,摩西,不透明的摩西,罪,石英,euv,外来材料和持续的未知颗粒。必威手机客户端
≤ 20 Å
Edge Placement (± from target)
AFM-guided nanomachining repair processes are defined by final geometry, independent of material composition, material interfaces or geometry being removed.
≤ 10 Å
Depth (Z) Control (± from target)
Extraordinary z control permits repairs to be specifically matched to the specified reference or differentially biased at or below the substrate surface for exact phase matching.

Eigenschaften

特征

Industry Leading Mask Repair Method

Nanomachining is a unique defect repair technique in the semiconductor industry, combining the positional control of an AFM and proprietary Nanomachining hardware and software to perform material removal at nanometer levels.

Its appeal lies in the precise and accurate removal of defects of various materials including chrome, MoSi, opaque MoSi, silicon nitride, quartz, EUV, foreign materials, and unknown particles. Its iterative repair capability and planar material removal guarantees repaired areas with a much wider “Through Focus” transmission window.

Addressing Industry's Critical Challenges

Bruker的AFM引导的纳米机器具有六代和近20年的内联经验,具有独特的优化和增强功能,可控制高端光掩膜的模式缺陷,随着特征大小和掩模复杂性的降低。值得注意的功能包括:

    • Standard BitClean® Function – Special hardware and software automation that provides final pre-pellicle local clean capability using the nanomachining tip for the removal of persistent unknown particle contamination.
      • Integrated local pattern copy functions come standard with the system.
        • Design Image Retrieval Package (optional) includes computer hardware and nm-VI system interface software. It provides the capability to retrieve segments of mask repair area pattern images from original design files, correct for AFM scanned image, display and overlay on the designated repair area for operator executed repair.

        A Technique with Minimal Trade-Offs

        The nm-VI offers production proven nanomachining with few downsides. The AFM-based nanomachining technique boasts the following over other (focused ion beam (FIB) and laser or electron beam) mask repair systems.

        • 没有真空要求
        • no chemistries
        • 没有化​​学残留物
        • no beam related charging effects
        • no need for constant drift correction by re-registration to undesirable positioning markers

        支持

        支持

        How Can We Help?

        Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术,并帮助客户选择正确的系统和配件。在工具出售工具很久之后,这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载

        Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.

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