nm-VI
5nm生产光掩模维修
强调
高级，关键级别的光鞋的精确修复
Bruker的AFM纳米机械系统是全球标准和首选生产技术，用于精确维修高级关键级别的光掩膜。NM-VI®系统是Bruker的第六代AFM引导的纳米机械。NM-VI将布鲁克（Bruker）与该公司脱颖而出，可以开发和交付与5纳米技术节点及以后的5纳米技术节点合作所需的创新纳米级材料成型过程。
特征
Industry Leading Mask Repair Method
纳米机械是半导体行业中一种独特的缺陷维修技术，结合了对AFM和专有纳米机械硬件和软件的位置控制，以在纳米水平上进行材料去除。
Its appeal lies in the precise and accurate removal of defects of various materials including chrome, MoSi, opaque MoSi, silicon nitride, quartz, EUV, foreign materials, and unknown particles. Its iterative repair capability and planar material removal guarantees repaired areas with a much wider “Through Focus” transmission window.
应对行业的关键挑战
Bruker的AFM引导的纳米机器具有六代和近20年的内联经验，具有独特的优化和增强功能，可控制高端光掩膜的模式缺陷，随着特征大小和掩模复杂性的降低。值得注意的功能包括：
- Standard BitClean® Function – Special hardware and software automation that provides final pre-pellicle local clean capability using the nanomachining tip for the removal of persistent unknown particle contamination.
- Integrated local pattern copy functions come standard with the system.
- Design Image Retrieval Package (optional) includes computer hardware and nm-VI system interface software. It provides the capability to retrieve segments of mask repair area pattern images from original design files, correct for AFM scanned image, display and overlay on the designated repair area for operator executed repair.
一种最少的权衡技术
NM-VI提供的生产已被证明是纳米机械的，几乎没有缺点。基于AFM的纳米机械技术具有以下其他（聚焦离子束（FIB）和激光或电子束）掩模修复系统。
- 没有真空要求
- no chemistries
- 没有化学残留物
- no beam related charging effects
- 无需通过重新注册到不良定位标记来持续漂移校正
支持
支持
How Can We Help?
Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术，并帮助客户选择正确的系统和配件。在工具出售工具很久之后，这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.