JV-DX
为各种薄膜应用设计
Punti salienti
JV-DX
Bruker JV-DX是用于材料研究，过程开发和质量控制的半导体薄膜分析的最新一代X射线计量系统。必威手机客户端该系统具有全自动源光学元件，可以在不用用户干预的情况下进行标准XRD，高分辨率XRD（HRXRD）和X射线反射模式。测量值是在配方中完全自动化的，并且能够在半手模式下执行更多的深奥测量。
卡特里斯蒂奇
Full 300mm Wafer Mapping
The instrument is designed for a variety of thin-film applications, including high resolution rocking curves, reciprocal space mapping, X-ray reflectivity, Grazing Incidence XRD, Phase ID, residual stress, film texture and grain size analysis, and XRF.
The sample stage consists of a robust 5-axis Eulerian cradle, with full 300 mm wafer mapping, and capacity for both large and small samples. Multiple sample locations for smaller samples are provided to enable multiple measurements across multiple samples to be queued and performed automatically, even of different measurement types.
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支持
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Bruker与我们的客户合作解决了现实世界中的应用程序问题。我们开发下一代技术，并帮助客户选择正确的系统和配件。在工具出售工具很久之后，这种合作伙伴关系继续通过培训和扩展服务。betway手机客户端下载
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.