JV-DX
Designed for a variety of thin-film applications
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JV-DX
The Bruker JV-DX is the latest generation of X-ray metrology system for semiconductor thin film analysis for materials’ research, process development and quality control. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution XRD (HRXRD) and X-ray reflectivity modes without user intervention. Measurements are fully automated within recipes with the ability to also perform more esoteric measurements in semi-manual mode.
Cechy charakterystyczne
Full 300mm Wafer Mapping
该仪器专为各种薄膜应用而设计，包括高分辨率摇摆曲线，互惠空间映射，X射线反射率，放牧入射XRD，相位ID，残余应力，薄膜纹理和晶粒尺寸分析和XRF。
The sample stage consists of a robust 5-axis Eulerian cradle, with full 300 mm wafer mapping, and capacity for both large and small samples. Multiple sample locations for smaller samples are provided to enable multiple measurements across multiple samples to be queued and performed automatically, even of different measurement types.
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Support
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Bruker partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
我们培训的支持工程师团队，应用科学家和主题专家完全致力于最大限度地利用系统服务和升级以及应用程序支持和培训的生产力。betway手机客户端下载