JV-DX
Designed for a variety of thin-film applications
Destaques
JV-DX
The Bruker JV-DX is the latest generation of X-ray metrology system for semiconductor thin film analysis for materials’ research, process development and quality control. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution XRD (HRXRD) and X-ray reflectivity modes without user intervention. Measurements are fully automated within recipes with the ability to also perform more esoteric measurements in semi-manual mode.
Características
完整的300mm晶圆映射
The instrument is designed for a variety of thin-film applications, including high resolution rocking curves, reciprocal space mapping, X-ray reflectivity, Grazing Incidence XRD, Phase ID, residual stress, film texture and grain size analysis, and XRF.
样品阶段由强大的5轴Eulerian摇篮组成，具有完整的300毫米晶片映射，以及大小样品的容量。提供了较小样品的多个样本位置，以实现多个样品的多个测量值，即自动排队和执行，即使是不同的测量类型。
Apoio
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How Can We Help?
布鲁克partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.