Trace Element Sensitivity with Minimal Sample Preparation
High-Speed Elemental X-ray Mapping even over Large Areas
Film Thickness Analysis
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10 ppm
detection limit
Enabling trace element analysis due to the lower spectral background
4 mm/s
travel speed
The optional Rapid Stage enables high-speed mapping over large areas
1 nm - 40 µm
layer thickness range
Thin films starting from 1 nm up to multiple layer structures of 40 µm can be analyzed
Micro-XRF as a Complimentary Analytical Technique to EDS Analysis in the SEM
Micro-X-ray Fluorescence (Micro- XRF) spectroscopy analysis is a complementary non-destructive analytical technique to traditional Energy Dispersive Spectroscopy (EDS) analysis using a Scanning Electron Microscope (SEM). Such analyses are important for the characterization of the elemental composition within unknown samples ranging from large centimeter sized inhomogeneous specimens down to small micrometer particles.
X-ray excitation yields a much higher sensitivity for trace element detection (down to as low as10 ppmfor certain elements), an extended X-ray spectral range (up to 40 keV), as well as information from greater depth within the sample.
Equipped with an X-ray tube in combination with a micro-focusing X-ray optic yields small spot sizes of30 µmwith high intensity throughput.
A modular piezo-based stage, specially designed to mount on top of the existing SEM stage enables high-speed elemental X-ray mapping “on the fly” over large areas up to a speed of4 mm/ sec. This enables the acquisition of X-ray mapping data over a sample size of 50 x 50 mm (or higher), incorporating light element spectral data as well as trace element and/ or higher energy X-ray data in a fast and user-friendly workflow.
The larger depth of X-ray excitation allows the characterization of multilayer systems starting from1 nm and ranging up to 40 µm, which is not possible with electron excitation.
Expand your SEM analytical capabilities with the Micro-XRF and Rapid Stage
Dual beam potential, both an e-beam and an X-ray beam, which offers new possibilities for the material characterization - Investigate samples simultaneously with both sources.
Using the same detector for simultaneous e-beam/ micro-XRF acquisition, incorporating light element spectral data as well as trace element and/ or higher energy X-ray data.
Combined EDS and micro-XRF quantification results in a more complete sample characterization by combining the better light element sensitivity of electron excitation with the better trace element sensitivity of XRF.
Simultaneous mapping with micro-XRF and e-beam excitation, combining the advantages from both worlds. Exciting the light elements (carbon to sodium) using the e-beam and heavier elements by micro-XRF.
Separate peaks & extended spectral range enables the capability to see the high energy K- lines since they are less complex and less overlapped.
Minimum sample prep – no conductive sample surface and no extensive polishing required